ABSTRACT: Among the scientific research platforms accommodated by the Core-laboratory at KAUST, the surface science laboratory is equipped with state-of-the-art instruments devoted for surface characterization. In particular, Dynamic Secondary Ion Mass Spectrometry (D-SIMS) is a powerful tool widely used for surface characterization permitting the identification of all elements (including isotopes) present in the materials with content down to ppb. SIMS instruments is commonly equipped with a sputtering beam so that the investigation and quantification of the elemental distribution can be performed in depth. In particular, depth resolution in the nm range can be achieved using SIMS making it a technique of choice for depth profiling multilayer devices.
Throughout this contribution, I will discuss the SIMS principles and review briefly the instrumentation aspect. The second part will be devoted to several examples obtained in our lab illustrating the information that can be derived from the SIMS data. The in-depth quantification using SIMS of elements incorporated either as dopant or as high content will be discussed. The presentation will be also focused on the SIMS characterization of multilayer devices and the limitation or artifacts that may be occurring during the sputtering process.
BIOGRAPHY: Dr. Nimer Wehbe is a Belgian researcher working as senior scientist in the Imaging and Characterization Core Lab at King Abdullah University of Science and Technology (KAUST). He received respectively his master’s (2002) and PhD degrees (2006) in chemistry and Physics from the University of Lyon in France where he was involved in fundamental studies dealing with the characterization of materials using ion beams. He worked for more than nine years as researcher at several Universities and research centers in Europe. Through his professional career evidenced by numerous published papers and conference talks, he has built a strong background in the field of material characterization using various surface analysis techniques such as Secondary Ion Mass Spectrometry (SIMS) and X-Ray Photoelectron Spectroscopy (XPS).